勤益科大機構典藏:Item 987654321/3937
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    Please use this identifier to cite or link to this item: http://ir.lib.ncut.edu.tw/handle/987654321/3937


    Title: Properties of polyimide/Al2O3 and Si3N4 deposited thin films
    Authors: 蔡美慧
    Contributors: 化工與材料工程系
    Date: 2010-07
    Issue Date: 2013-06-27 10:59:06 (UTC+8)
    Publisher: [Lausanne, Switzerland, etc.] Elsevier Sequoia
    Relation: Thin Solid Films
    Appears in Collections:[Department of Chemical and Materials Engineering] 【化工與材料工程系】期刊論文

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