Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics

NCUTIR > College of Engineering > Department of Mechanical Engineering > 【機械工程系】期刊論文 > Item 987654321/4163

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Title:	Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics
Authors:	江東源
Contributors:	機械工程(學)系
Date:	2010-03
Issue Date:	2013-07-09 10:04:56 (UTC+8)
Publisher:	[Amsterdam : New York] : North-Holland
Relation:	Applied Surface Science; 256(10)
Appears in Collections:	[Department of Mechanical Engineering] 【機械工程系】期刊論文

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