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    請使用永久網址來引用或連結此文件: http://ir.lib.ncut.edu.tw/handle/987654321/5790


    題名: Structural and mechanical properties of magnetron sputtered Ti–V–Cr–Al–N films
    作者: Du-Cheng Tsaia, Zue-Chin Changb, Bing-Hau Kuoa, Ming-Hua Shiaoc, Fuh-Sheng Shieu
    貢獻者: 圖書館
    關鍵詞: Coating materials
    Nitride materials
    Thin films
    Vapor deposition
    Crystal structure
    日期: 2013
    上傳時間: 2016-10-13 13:57:09 (UTC+8)
    摘要: Ti–V–Cr–Al–N films were prepared by dc magnetron co-sputtering by utilizing TiVCr and Al targets. By using glancing incidence X-ray diffraction, a single NaCl solid solution phase with (2 0 0) preferred orientation for the Al-doped films was revealed, as opposed to the undoped films that possessed predominantly (1 1 1) preferred orientation. This indicates that Al addition can lead to the enhancement of adatom mobility and consequently, to a thermodynamically favorable (2 0 0) orientation. This also leads to grain growth and increased surface roughness. However, based on results from transmission electron microscopy, the microstructure morphology seemed independent of the Al concentration, implying that adatom mobility is not sufficient for the barriers present at the grain boundaries. Accordingly, hardness was enhanced by the increase in Al concentration.
    關聯: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
    顯示於類別:[機械工程系(所)] 【機械工程系】期刊論文

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