勤益科大機構典藏:Item 987654321/6614
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    Please use this identifier to cite or link to this item: http://ir.lib.ncut.edu.tw/handle/987654321/6614


    Title: A Correlation between the Kinetics and Thermodynamics for the Photo-Electrochemical Etching of N-Si in 2MHF-Ethanolic Solutions
    Authors: 鄭文達
    Contributors: 機械工程(學)系
    Date: 2011-08
    Issue Date: 2017-11-14 10:10:16 (UTC+8)
    Abstract: In the photo-electrochemical etching of Si/HF system, the kinetics was investigated extensively in the literature. Usually, any problem belonging to science and engineering was solved using both thermodynamic and kinetic aspects. In this work, the kinetic of the system was correlated with the thermodynamics, by introducing the energy bend diagrams, to comprehend the etching trend. The effect of ethanol added into the system was concerned. The results from photo-electrochemical kinetics (i.e., i-v diagram) are in agreement with that expected from thermodynamics via estimation of activation energy estimation from the corresponding energy band diagrams. The SEM morphology reconfirmed the result inferred from both aspects. © The Electrochemical Society. (6 refs)
    Relation: ECS Transactions
    Appears in Collections:[Department of Mechanical Engineering] 【機械工程系】期刊論文

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