Nanotribological behavior of thermal treatment of zinc titanate thin films

勤益科大機構典藏 > 工程學院 > 機械工程系(所) > 【機械工程系】期刊論文 > Item 987654321/6971

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题名:	Nanotribological behavior of thermal treatment of zinc titanate thin films
作者:	姚威宏
贡献者:	機械工程(學)系
日期:	2012-05
上传时间:	2017-12-18 09:33:17 (UTC+8)
摘要:	We present a study of the nanotribological behavior of ZnTiO3 films; the surface morphology, stoichiometry, and friction (μ) were analyzed using atomic force microscopy, X-ray photoelectron spectroscopy, and nanoscratch system. It is confirmed that the measured values of H and μ of the ZnTiO3 films were in the range from 8.5 ± 0.4 to 5.6 ± 0.4 GPa and from 0.164 to 0.226, respectively. It is suggested that the hexagonal ZnTiO3 decomposes into cubic Zn2TiO4 and rutile TiO2 based on the thermal treatment; the H, μ, and RMS were changed owing to the grain growth and recovery that results in a relax crystallinity of ZnTiO3 films. From X-ray photoelectron spectroscopy measured, core levels of O 1 can attribute the weaker bonds as well as lower resistance after thermal treatment. The XRD patterns showed that as-deposited films are mainly amorphous; however, the hexagonal ZnTiO3 phase was observed with the ZnTiO3 (104), (110), (116), and (214) peaks from 620 to 820 °C, indicating that there is highly (104)-oriented ZnTiO3 on the silicon substrate.
關聯:	Surface and Interface Analysis
显示于类别:	[機械工程系(所)] 【機械工程系】期刊論文

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