勤益科大機構典藏:Item 987654321/4533
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    Please use this identifier to cite or link to this item: http://ir.lib.ncut.edu.tw/handle/987654321/4533


    Title: 鉻緩衝層厚度在鈦酸鍶鋇薄膜之介電性質 及機械應力之研究
    Authors: 黃瓊慧
    林金雄
    李顯億
    Contributors: 機械工程系
    Keywords: Temperature coefficient of capacitance (TCC)
    射頻磁控濺鍍
    緩衝層
    Cr seeding layer
    Date: 2013-06
    Issue Date: 2013-07-23 14:12:51 (UTC+8)
    Publisher: 台中;國立勤益科技大學
    Abstract: 本研究以射頻磁控濺鍍法在p型(100)矽基板上沉積鈦酸鍶鋇(Ba0.5Sr0.5TiO3, BST)薄膜，其實驗樣品結構為Al/(Ba0.5Sr0.5)TiO3/ Cr/Pt/Ti/SiO2/Si ，並探討不同厚度之Cr緩衝層中BST薄膜之特性分析。由於未加Cr緩衝層之BST薄膜有較大的表面粗糙度、較差之漏電流、介電損失與熱穩定係數。在BST薄膜基板結構中加入Cr = 2 nm緩衝層其介電損失、漏電流、熱穩定度、揚氏係數、殘留應力比BST薄膜未加入Cr緩衝層分別改善約59%, 1 個數量級在 +62.5 kV/cm (+1 V), 35 %, 41 %, 和 28 %。
    Appears in Collections:[Department of Mechanical Engineering] 【機械工程系】博碩士論文

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